Abstract This seminar is intended to provide a general understanding of: 1. Do the issues we are used to in hybrid production still relevant? 2. What is plasma and can it address the issues previously mentioned? 3. What are the interaction mechanisms between organics and plasma? . Many already concede that plasma is the most environmentally safe method of both the organic removal and surface modification to date, but is cleanliness still an issue? Hybrid circuits have begun to approach the critical dimensions of semiconductors in the late 1960''s with the advent of CSP, BGA and FC. Rather than eliminate cleaning, these new smaller circuits presented a whole new criteria for cleaning and removal of organics. This seminar will review the current industry and how it addresses the cleaning issue in terms of effectiveness and application. 等離子體清洗機/等離子體表面處理儀